TiO2 thin films on si substrate obtained by PLD for sensing applications
Titanium dioxide (TiO2) thin films were deposited by pulsed laser deposition on Si substrate. An KrF excimer laser with wavelength of 248 nm was used for the irradiation of TiO2 targets. The substrates were heated during the film deposition at 400°C under an oxygen pressure of 35 mTorr, 50 mTorr and...
Elmentve itt :
Szerzők: |
Bandas Cornelia Cernica Ileana Orha Corina Rus Stefania Lazau Carmen |
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Testületi szerző: | International Symposium on Analytical and Environmental Problems (21.) (2015) (Szeged) |
Dokumentumtípus: | Könyv része |
Megjelent: |
2015
|
Sorozat: | Proceedings of the International Symposium on Analytical and Environmental Problems
21 |
Kulcsszavak: | Elektrokémia |
Online Access: | http://acta.bibl.u-szeged.hu/55936 |
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