Influence of the confinement on laser-induced dry etching at the rear side of fused silica
Abstract: Laser-induced etching at the rear side of transparent material enables high-quality machining results. However, the mechanism is still not completely recognized which would allow further optimization. Therefore, multi-pulsed laser-induced backside dry etching with different thick photoresi...
Elmentve itt :
| Szerzők: | |
|---|---|
| Dokumentumtípus: | Cikk |
| Megjelent: |
Springer-Verlag
2016
|
| Sorozat: | APPLIED PHYSICS A - MATERIALS SCIENCE AND PROCESSING
122 No. 4 |
| doi: | 10.1007/s00339-016-9925-x |
| mtmt: | 3043506 |
| Online Access: | http://publicatio.bibl.u-szeged.hu/9089 |